Coating structure and thickness Absorption, solar absorbance Refractive indices Reflectivity & Transmission
Optimization and check of coating performances against severe environmental conditions:
humidity thermal cycling radiations
Aerospace Defense Industry
ION BEAM FIGURING
SURFACE CORRECTION BY MATERIAL ABLATION (FIGURING)
Example on SiC mirror 90 mm
RMS=243 nm RMS=13 nm PV=1050 nm PV=86 nm
SURFACE MODIFICATION BY MATERIAL ABLATION (TEXTURATION)
Modification of Surface roughness – impact on light scattering
Laser generation of nanoparticles in liquids matrices
Spin, dip or spray coating on surfaces possible
Self-standing films or foils possible
Modification of optical, mechanical and thermal properties of materials Radiation shielding Biomedicals Emissivity control Photovoltaïcs Catalytic solutions
Scanning Electron Microscope Optical interferometer Optical profilometer Atomic force microscope
VIS/IR ellipsometer Spectrophotometer
CSL is operating a Direct Laser Writing (DLW) facility, which allows recording microstructures (periodic or not) with details ranging from a few millimeters down to 0.5 micrometer, onto 140 mm x 140 mm substrates.
CSL is also equipped with holographic benches to record high resolution and high quality diffraction gratings.
Microstructured coatings (masks, reticles, ...) can also be obtained by combining photolithography with thin film deposition, thanks to CSL’s various coating equipments.
Reactive Plasma Beam Etching (RPBE) is used to transfer micro-structures into a monolithic substrate. The interest of such a technique comes particularly from its high selectivity, the potential to efficiently etch one material and not another one, used as a mask. RPBE is widely used in the fabrication of micro-optical elements such as diffraction grating, phase plates, inserts …
CSL is also operating an excimer laser facility for direct ablation of various materials, with details down to 2 micrometers.
CSL has developed several efficient techniques for high and middle volume replication of micro-structures.
Hot embossing uses electroplated metallic master of a photolithographically originated element to be applied as a mould onto polymer or low-Tg glass substrates for pattern transfer.
Soft UV-embossing allows replicating a micro-structured pattern into UV curable photopolymer coated on a rigid substrate (nanoimprint).